Large area radio frequency plasma for microelectronics processing
نویسندگان
چکیده
منابع مشابه
Large area radio frequency plasma for microelectronics processing
Radio-frequency ~rf! inductively coupled planar plasma ~ICP! provides a better way to generate spatially confined high density gas discharge plasmas for microelectronics processing. Commercial processing equipment using this technique is currently available, but is limited in size to 20 cm in diameter by problems with plasma uniformity and antenna dielectric window erosion. We have developed a ...
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ژورنال
عنوان ژورنال: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
سال: 1995
ISSN: 0734-2101,1520-8559
DOI: 10.1116/1.579844